硅片,单晶硅片,抛光硅片,硅片价格,晶圆,碳化硅,砷化镓,晶片蓝宝石,硅衬底,SOI硅片,N型硅片,P型硅片,硅片厂家,氧化硅片,薄硅片,厚硅片,区熔硅片,锗晶片,外延硅片,直拉硅片,单晶硅片,铌酸锂,LN,钽酸锂,LT,silicon wafers, silicon, silicon slices, prime silicon wafers, test silicon wafers, particle monitor silicon wafers, furnace silicon wafers, mechanical silicon wafers, silicon wafer processing, silicon wafer servicessilicon wafers, silicon, silicon slices, prime silicon wafers, test silicon wafers, particle monitor silicon wafers, furnace silicon wafers, mechanical silicon wafers, silicon wafer processing, silicon wafer servicessilicon wafers, silicon, silicon slices, prime silicon wafers, test silicon wafers, particle monitor silicon wafers, furnace silicon wafers, mechanical silicon wafers, silicon wafer processing, silicon wafer servicessilicon wafers, silicon, silicon slices, prime silicon wafers, test silicon wafers, particle monitor silicon wafers, furnace silicon wafers, mechanical silicon wafers, silicon wafer processing, silicon wafer services, CRYSTALS, BaB2O4, BaF2, CaF2, LiF, MgF2, KBr, KCl, NaCl, CsI, CaCO3, KRS-5, KRS-6, KDP, KTP, PbMoO4, LiIO3, LiNbO3, Quartz, Sapphire, Scintillators, TeO2, TiO2, Rutile, ZnSe, Thermal Oxide, PSG/BPSG, Plasma Nitride, Polysilicon, Photolithography, Epitaxy, Metals, Photo Resist Coating, LPCVD Silicon Nitride, Plasma Oxide, TEOS Oxide, LTO,wafer fabrication,sic wafer,gaas wafer,dummy wafer,soi wafer,glass wafer,semiconductor wafer,silicon oxide,si wafer,quartz wafer,silicon,silicon nitride,epi wafer,silicon on insulator,polished wafer,monocrystalline silicon,semiconductor manufacturing,silicon wafer price,硅片,抛光硅片,硅片价格,晶圆,碳化硅晶片,砷化镓晶片,晶片蓝宝石,硅衬底,SOI硅片,N型硅片,P型硅片,硅片厂家,氧化硅片,薄硅片,厚硅片,区熔硅片,锗晶片,外延硅片,直拉硅片


Grade	Dimeter	Type/dopant	Orientaion	thickness	Resistivity	Flat	Surface/Roughness	Geometric parameter
(最优)Prime	25.4mm 50.8mm 76.5mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	400um+/-20 400um+/- 20 400um+/-20	0.0001 - 200 Ohm-cm /Customization	N/A 16mm 22.5mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
100mm 125mm 150mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	525um+/-20 625um+/-20 625um+/-20	0.0001 - 200 Ohm-cm /Customization	32.5mm 42.5mm 57.5mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
200mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	725um+/-20	0.0001 - 200 Ohm-cm /Customization	nothch/flat	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
300mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	775um+/-20	0.0001 - 200 Ohm-cm /Customization	notch/flat	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30umRa<0.5nm
挡片控片(Dummy）	25.4mm 50.8mm 76.5mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	400um+/-20 400um+/- 20 400um+/-20	0.0001 - 200 Ohm-cm /Customization	N/A 16mm 22.5mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
100mm 125mm 150mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	525um+/-20 625um+/-20 625um+/-20	0.0001 - 200 Ohm-cm /Customization	32.5mm 42.5mm 57.5mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
200mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	725um+/-20	0.0001 - 200 Ohm-cm /Customization	nothch/flat	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
300mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	775um+/-20	0.0001 - 200 Ohm-cm /Customization	notch/flat	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30umRa<0.5nm
extra thick wafer	25.4mm 50.8mm 76.5mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	>=1000um customization	0.0001 - 200 Ohm-cm /Customization	N/A 16mm 22.5mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
100mm 125mm 150mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	>=1000um customization	0.0001 - 200 Ohm-cm /Customization	32.5mm 42.5mm 57.5mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
200mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	>2000um customization	0.0001 - 200 Ohm-cm /Customization	notch/flat	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
300mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	>2000um customization	0.0001 - 200 Ohm-cm /Customization	notch/flat	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
extra thin wafer	25.4mm 50.8mm 76.5mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	100um 200um customization	0.0001 - 200 Ohm-cm /Customization	N/A 16mm 22.5mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
100mm 125mm 150mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	1000um 2000um customization	0.0001 - 200 Ohm-cm /Customization	16mm+/-2mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
200mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	1000um 2000um customization	0.0001 - 200 Ohm-cm /Customization	16mm+/-2mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
300mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	1000um 2000um customization	0.0001 - 200 Ohm-cm /Customization	16mm+/-2mm	polished/etched polished/polished	TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm
extra flat wafer	25.4mm 50.8mm 76.5mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	400um+/-20 400um+/- 20 400um+/-20	0.0001 - 200 Ohm-cm /Customization	N/A 16mm 22.5mm	polished/etched polished/polished	TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um Ra<0.5nm
100mm 125mm 150mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	525um+/-20 625um+/-20 625um+/-20	0.0001 - 200 Ohm-cm /Customization	32.5mm 42.5mm 57.5mm	polished/etched polished/polished	TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um Ra<0.5nm
200mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	725um+/-20	0.0001 - 200 Ohm-cm /Customization	nothch/flat	polished/etched polished/polished	TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um
300mm	P(Boron) N(Phos/As/Sb)	<100> <111> or special orientation	775um+/-20	0.0001 - 200 Ohm-cm /Customization	notch/flat	polished/etched polished/polished	TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um Ra<0.5nm

(最优)Prime

25.4mm 50.8mm 76.5mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

400um+/-20 400um+/- 20 400um+/-20

0.0001 - 200 Ohm-cm /Customization

N/A 16mm 22.5mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

100mm 125mm 150mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

525um+/-20 625um+/-20 625um+/-20

0.0001 - 200 Ohm-cm /Customization

32.5mm 42.5mm 57.5mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

200mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

725um+/-20

0.0001 - 200 Ohm-cm /Customization

nothch/flat

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

300mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

775um+/-20

0.0001 - 200 Ohm-cm /Customization

notch/flat

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30umRa<0.5nm

挡片控片(Dummy）

25.4mm 50.8mm 76.5mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

400um+/-20 400um+/- 20 400um+/-20

0.0001 - 200 Ohm-cm /Customization

N/A 16mm 22.5mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

100mm 125mm 150mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

525um+/-20 625um+/-20 625um+/-20

0.0001 - 200 Ohm-cm /Customization

32.5mm 42.5mm 57.5mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

200mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

725um+/-20

0.0001 - 200 Ohm-cm /Customization

nothch/flat

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

300mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

775um+/-20

0.0001 - 200 Ohm-cm /Customization

notch/flat

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30umRa<0.5nm

extra thick wafer

25.4mm 50.8mm 76.5mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

>=1000um customization

0.0001 - 200 Ohm-cm /Customization

N/A 16mm 22.5mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

100mm 125mm 150mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

>=1000um customization

0.0001 - 200 Ohm-cm /Customization

32.5mm 42.5mm 57.5mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

200mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

>2000um customization

0.0001 - 200 Ohm-cm /Customization

notch/flat

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

300mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

>2000um customization

0.0001 - 200 Ohm-cm /Customization

notch/flat

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

extra thin wafer

25.4mm 50.8mm 76.5mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

100um 200um customization

0.0001 - 200 Ohm-cm /Customization

N/A 16mm 22.5mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

100mm 125mm 150mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

1000um 2000um customization

0.0001 - 200 Ohm-cm /Customization

16mm+/-2mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

200mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

1000um 2000um customization

0.0001 - 200 Ohm-cm /Customization

16mm+/-2mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

300mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

1000um 2000um customization

0.0001 - 200 Ohm-cm /Customization

16mm+/-2mm

polished/etched polished/polished

TTV < 5um TIR <3um STIR < 2um BOW < 20um Warp < 30um Ra<0.5nm

extra flat wafer

25.4mm 50.8mm 76.5mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

400um+/-20 400um+/- 20 400um+/-20

0.0001 - 200 Ohm-cm /Customization

N/A 16mm 22.5mm

polished/etched polished/polished

TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um Ra<0.5nm

100mm 125mm 150mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

525um+/-20 625um+/-20 625um+/-20

0.0001 - 200 Ohm-cm /Customization

32.5mm 42.5mm 57.5mm

polished/etched polished/polished

TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um Ra<0.5nm

200mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

725um+/-20

0.0001 - 200 Ohm-cm /Customization

nothch/flat

polished/etched polished/polished

TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um

300mm

P(Boron) N(Phos/As/Sb)

<100> <111> or special orientation

775um+/-20

0.0001 - 200 Ohm-cm /Customization

notch/flat

polished/etched polished/polished

TTV < 2um TIR <1um STIR < 1um BOW < 10um Warp < 10um Ra<0.5nm

CZ silicon wafers

WaferHome can manufacture the high purity 99.999999999% IC grade silicon wafer

Contact info

Specification for CZ Growth Siliocn Wafer